
High Purity
Component Business
CVD SiC (Chemical Vapor Deposition Silicon Carbide) is a technology that deposits SiC using the chemical vapor deposition method. Over the years, we have developed the capability to deposit from thin films to bulk forms of several millimeters, securing a stable production process.
CVD-SiC coated components are produced using advanced CVD techniques, effectively suppressing out-gassing and particle generation from the base material. This ensures stable performance even in high-temperature and vacuum environments, providing the essential high purity and durability required in semiconductor and advanced industrial processes. With exceptional corrosion and heat resistance, these components extend equipment lifespan and maximize process reliability.
High Purity
High Chemical
Resistance
Usable under
Oxidation Atmosphere
Stable in
High Temperature
No Outgassing