Component Business

Coated CVD SiC

CVD SiC (Chemical Vapor Deposition Silicon Carbide) is a technology that deposits SiC using the chemical vapor deposition method.
Over the years, we have developed the capability to deposit from thin films to bulk forms of several millimeters, securing a stable production process.

CVD SiC Coated Components

CVD-SiC coated components are produced using advanced CVD techniques, effectively suppressing out-gassing and particle generation from the base material. This ensures stable performance even in high-temperature and vacuum environments, providing the essential high purity and durability required in semiconductor and advanced industrial processes. With exceptional corrosion and heat resistance, these components extend equipment lifespan and maximize process reliability.

Product
Features

High Purity

High Chemical
Resistance

Usable under
Oxidation Atmosphere

Stable in
High Temperature

No Outgassing

Product Lineup

  • 01
    Susceptor
    The susceptor is primarily used in CVD and epitaxy processes.
    It supports and rotates the wafer, while guiding gases to flow uniformly throughout the process.

Contact

  • Contact Person
    Mr. LEE, Chang Min / Sales Team Leader
  • Tel
    070-7201-8963
  • Email
    changmin.lee@knj.kr