
High corrosion
resistance
Component Business
CVD SiC (Chemical Vapor Deposition Silicon Carbide) is a technology that deposits SiC using the chemical vapor deposition method. Over the years, we have developed the capability to deposit from thin films to bulk forms of several millimeters, securing a stable production process.
Produced via CVD processes, these high-performance materials offer excellent durability in high-temperature, high-pressure, and chemically corrosive environments, making them widely used in semiconductor, aerospace, and energy industries. In particular, CVD SiC parts used in semiconductor processes improve process yield with high durability and stability.
High corrosion
resistance
High chemical
resistance
Long lifetime
compared to Si
No heat
deformation
High-purity particle generation
suitable for semiconductor
processes
Excellent hardness
and strength
Property | KNJ Value | Unit |
---|---|---|
Purity | 99.9999 | - |
Density | 3.21 | g/cm³ |
Porosity | Negligible | - |
Elastic Modulus | 466 | GPa |
Flexural Strength | 506.7 | MPa |
Vickers Hardness | 2540 | kg/mm² |
Thermal Conductivity | 267.2 | W/m*K |
CTE(100~1000°C) | 4~4.5 | 10⁻⁶/K |
Volume Resistivity | According to customer requirements | Ω*cm |